发明授权
US07983776B2 System and method for matching silicon oxide thickness between similar process tools
有权
在相似的工艺工具之间匹配氧化硅厚度的系统和方法
- 专利标题： System and method for matching silicon oxide thickness between similar process tools
- 专利标题（中）： 在相似的工艺工具之间匹配氧化硅厚度的系统和方法
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申请号： US11937027申请日： 2007-11-08
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公开(公告)号： US07983776B2公开(公告)日： 2011-07-19
- 发明人: Miles Dudman , Andrew Le
- 申请人： Miles Dudman , Andrew Le
- 申请人地址： US CA San Jose
- 专利权人： Micrel, Inc.
- 当前专利权人： Micrel, Inc.
- 当前专利权人地址： US CA San Jose
- 代理机构： Sawyer Law Group, P.C.
- 主分类号： G06F19/00
- IPC分类号： G06F19/00
摘要：
The present invention is one or more implementations is a method of fabricating a semiconductor for improved oxide thickness control, defining a process tool, determining and evaluating performance variables, determining a performance impact factor and thereafter modifying control of the process tool in the fabrication process to operate in direct relation to the determined results of the present invention. The present invention sets forth definitive advantages in reducing engineering time, improving process controls and improving cycle-times.
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