发明授权
- 专利标题: Mass flow rate control apparatus, its calibration method and semiconductor-producing apparatus
- 专利标题(中): 质量流量控制装置,其校准方法和半导体制造装置
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申请号: US11688345申请日: 2007-03-20
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公开(公告)号: US07979165B2公开(公告)日: 2011-07-12
- 发明人: Takao Gotoh , Akifumi Hayashi , Tohru Matsuoka , Shigehiro Suzuki , Yoshiyuki Furukawa , Makoto Tanaka
- 申请人: Takao Gotoh , Akifumi Hayashi , Tohru Matsuoka , Shigehiro Suzuki , Yoshiyuki Furukawa , Makoto Tanaka
- 申请人地址: JP Tokyo
- 专利权人: Hitachi Metals, Ltd.
- 当前专利权人: Hitachi Metals, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2006-076980 20060320; JP2006-337917 20061215
- 主分类号: G05D7/06
- IPC分类号: G05D7/06 ; G01F1/66
摘要:
A method for calibrating a mass flow controller comprising a calibrating valve disposed on the most upstream side of a path, a mass flow rate control valve mechanism, a tank provided at the path on the upstream side of the mass flow rate control valve mechanism, a mass-flow-rate-sensing means, a pressure-sensing means, a means for controlling the mass flow rate control valve mechanism, and a mass flow rate calibration control means, the method comprising the steps of (1) permitting a fluid at a set mass flow rate to flow through the path, (2) setting the mass flow rate control valve mechanism at a degree of opening that the mass flow rate of the fluid is equal to the set mass flow rate, (3) closing the calibrating valve, (4) measuring the pressure and mass flow rate of the fluid after a fluid flow from the tank is stabilized, (5) determining a variation ratio of the pressure and mass flow rate to reference pressure and mass flow rate measured by the same procedures in an initial state, and (6) performing calibration depending on the variation ratio.
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