- 专利标题: Semiconductor devices with non-punch-through semiconductor channels having enhanced conduction and methods of making
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申请号: US12117121申请日: 2008-05-08
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公开(公告)号: US07977713B2公开(公告)日: 2011-07-12
- 发明人: Igor Sankin , David C. Sheridan , Joseph Neil Merrett
- 申请人: Igor Sankin , David C. Sheridan , Joseph Neil Merrett
- 申请人地址: US MS Starkville
- 专利权人: Semisouth Laboratories, Inc.
- 当前专利权人: Semisouth Laboratories, Inc.
- 当前专利权人地址: US MS Starkville
- 代理机构: Morris, Manning & Martin, LLP
- 代理商 Christopher W. Raimund
- 主分类号: H01L29/772
- IPC分类号: H01L29/772
摘要:
Semiconductor devices are described wherein current flow in the device is confined between the rectifying junctions (e.g., p-n junctions or metal-semiconductor junctions). The device provides non-punch-through behavior and enhanced current conduction capability. The devices can be power semiconductor devices as such as Junction Field-Effect Transistors (VJFETs), Static Induction Transistors (SITs), Junction Field Effect Thyristors, or JFET current limiters. The devices can be made in wide bandgap semiconductors such as silicon carbide (SiC). According to some embodiments, the device can be a normally-off SiC vertical junction field effect transistor. Methods of making the devices and circuits comprising the devices are also described.
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