发明授权
US07977628B2 System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
有权
通过将光束互补孔径形状与光束形状匹配来减少颗粒和污染的系统和方法
- 专利标题： System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
- 专利标题（中）： 通过将光束互补孔径形状与光束形状匹配来减少颗粒和污染的系统和方法
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申请号： US12146122申请日： 2008-06-25
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公开(公告)号： US07977628B2公开(公告)日： 2011-07-12
- 发明人: John Francis Grant , Patrick Richard Splinter
- 申请人： John Francis Grant , Patrick Richard Splinter
- 申请人地址： US MA Beverly
- 专利权人： Axcelis Technologies, Inc.
- 当前专利权人： Axcelis Technologies, Inc.
- 当前专利权人地址： US MA Beverly
- 代理机构： Eschweiler & Associates, LLC
- 主分类号： H01J49/00
- IPC分类号： H01J49/00
摘要：
An ion implantation system comprising an ion source configured to generate an ion beam along a beam path, a mass analyzer is located downstream of the ion source wherein the mass analyzer is configured to perform mass analysis of the ion beam and a beam complementary aperture located downstream of the mass analyzer and along the beam path, the beam complementary aperture having a size and shape corresponding to a cross-sectional beam envelope of the ion beam.
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