发明授权
- 专利标题: Radiation-sensitive composition, polymer and monomer
- 专利标题(中): 辐射敏感组合物,聚合物和单体
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申请号: US12875133申请日: 2010-09-03
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公开(公告)号: US07977442B2公开(公告)日: 2011-07-12
- 发明人: Ken Maruyama , Daisuke Shimizu
- 申请人: Ken Maruyama , Daisuke Shimizu
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Ditthavong Mori & Steiner, P.C.
- 优先权: JP2008-054099 20080304; JP2008-211089 20080819
- 主分类号: C08F222/20
- IPC分类号: C08F222/20 ; C07C69/593 ; G03C1/73 ; C08F4/04
摘要:
A polymer includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom or a methyl group, R2 represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an alicyclic group having 3 to 25 carbon atoms, or an aryl group having 6 to 22 carbon atoms, and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted linear, branched or alicyclic hydrocarbon group having 2 to 25 carbon atoms. The polymer has a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3000 to 100,000.
公开/授权文献
- US20100331440A1 RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER 公开/授权日:2010-12-30
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