发明授权
- 专利标题： Temperature control method, temperature control apparatus and high/low temperature processing system
- 专利标题（中）： 温度控制方法，温度控制装置和高/低温处理系统
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申请号： US11857042申请日： 2007-09-18
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公开(公告)号： US07975759B2公开(公告)日： 2011-07-12
- 发明人: Masataka Hatta , Yoshinao Kono , Toshikazu Ariyama , Kazuki Hosaka
- 申请人： Masataka Hatta , Yoshinao Kono , Toshikazu Ariyama , Kazuki Hosaka
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2006-253490 20060919
- 主分类号： F28D5/00
- IPC分类号： F28D5/00
摘要：
A temperature control apparatus that controls a temperature of a target object by a heat exchange between a temperature control liquid and the target object. The apparatus includes a pressurizing unit that pressurizes the temperature control liquid to increase a boiling point thereof; a heating unit that increases a temperature of the temperature control liquid to become higher than or equal to a boiling point of the temperature control liquid observed at a normal pressure; and a heat exchanging unit that exchanges heat between the target object and the temperature control liquid whose temperature has been increased to become higher than or equal to the boiling point of the temperature control liquid observed at the normal pressure.
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