发明授权
- 专利标题： Measurement method and apparatus, exposure apparatus
- 专利标题（中）： 测量方法和装置，曝光装置
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申请号： US12499531申请日： 2009-07-08
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公开(公告)号： US07924437B2公开(公告)日： 2011-04-12
- 发明人: Kazuki Yamamoto
- 申请人： Kazuki Yamamoto
- 申请人地址： JP
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP
- 代理机构： Rossi, Kimms & McDowell LLP
- 优先权： JP2006-101874 20060403
- 主分类号： G01B11/02
- IPC分类号： G01B11/02
摘要：
A measurement method for measuring a wavefront aberration of a target optical system using a measurement apparatus that measures the wavefront aberration of the target optical system by detecting an interference pattern includes the steps of measuring as a system parameter a shift from a design value of a value that defines a structure of the measurement apparatus and the target optical system, and measuring the wavefront aberration of the target optical system using the system parameter.
公开/授权文献
- US20090303453A1 MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS 公开/授权日：2009-12-10
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