发明授权
- 专利标题: Exposure device
- 专利标题(中): 曝光装置
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申请号: US12135375申请日: 2008-06-09
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公开(公告)号: US07924407B2公开(公告)日: 2011-04-12
- 发明人: Takashi Okuyama
- 申请人: Takashi Okuyama
- 申请人地址: JP Tokyo
- 专利权人: ORC Manufacturing Co., Ltd.
- 当前专利权人: ORC Manufacturing Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Berenato & White, LLC
- 优先权: JP2007-171880 20070629
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/42 ; G02B26/00 ; G02B26/12
摘要:
The present invention relates to an exposure device for forming circuit patterns onto a surface of an object. The exposure device includes at least one spatial light modulator which includes a plurality of reflection elements being arranged in a matrix fashion, at least one optical source which supplies exposure light to the reflection elements, and a bias voltage controller which applies a first voltage to the reflection elements, thereby setting the reflection elements to a first state and which does not apply a voltage to the reflection elements, thereby setting the reflection elements to a second state. In addition, the exposure light is delivered to the surface of the object in the first state, and the exposure light is not delivered to the surface of the object in the second state.
公开/授权文献
- US20090001292A1 EXPOSURE DEVICE 公开/授权日:2009-01-01
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