发明授权
US07923704B2 Charged particle beam writing method 有权
带电粒子束写入方式

Charged particle beam writing method
摘要:
A charged particle beam writing method includes writing a pattern on a first target object by using a charged particle beam in a writing apparatus; and conveying a second target object after having written the pattern on the first target object, wherein even though the second target object is arranged on any one of conveying paths including a carry-out port and a carry-in port of the writing apparatus, a conveying operation for the second target object is not performed during writing the pattern on the first target object.
公开/授权文献
信息查询
0/0