Invention Grant
- Patent Title: Method for treatment of samples for transmission electron microscopes
- Patent Title (中): 透射电子显微镜样品处理方法
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Application No.: US12258965Application Date: 2008-10-27
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Publication No.: US07923683B2Publication Date: 2011-04-12
- Inventor: Qi Hua Zhang , Chorng Shyr Niou , Pan Liu , Ming Li
- Applicant: Qi Hua Zhang , Chorng Shyr Niou , Pan Liu , Ming Li
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Townsend and Townsend and Crew LLP
- Priority: CN200810040369 20080708
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06K9/00

Abstract:
A method for analyzing a sample for the manufacture of integrated circuits, e.g., dynamic random access memory devices, commonly called DRAMS. The method also provides an integrated chip including a thickness, a width, and a length. In a specific embodiment, the integrated chip has at least one elongated structure through a portion of the thickness, while being normal to the width and the length. In a specific embodiment, the elongated structure has a structure width and a structure length that extends through a vertical portion of the thickness. The method includes removing a slice of the integrated chip from a portion of the thickness in a directional manner normal to the structure length. In a specific embodiment, the slice is provided through an entirety of the one elongated structure along the structure length to cause a portion of a thickness of the slice providing the elongated structure to be of a substantially uniform sample thickness. The method also includes capturing one or more images through a portion of the slice using a transmission electron microscope.
Public/Granted literature
- US20100006754A1 METHOD FOR TREATMENT OF SAMPLES FOR TRANSMISSION ELECTRONIC MICROSCOPES Public/Granted day:2010-01-14
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