发明授权
- 专利标题： Analysis method and analysis apparatus
- 专利标题（中）： 分析方法和分析仪器
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申请号： US12280845申请日： 2007-06-21
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公开(公告)号： US07923680B2公开(公告)日： 2011-04-12
- 发明人: Kazuya Dobashi , Shigeru Kawamura , Kohei Tsugita , Teruyuki Hayashi
- 申请人： Kazuya Dobashi , Shigeru Kawamura , Kohei Tsugita , Teruyuki Hayashi
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2006-196946 20060719
- 国际申请： PCT/JP2007/062526 WO 20070621
- 国际公布： WO2008/010385 WO 20080124
- 主分类号： H01J49/00
- IPC分类号： H01J49/00
摘要：
An analysis apparatus includes a first process part for removing a film formed on a substrate by irradiating the film with ultraviolet light, a second process part for providing a solution onto a surface of the substrate for dissolving an object being analyzed on the substrate, and a third process part for analyzing the object being analyzed in the solution that is used in the second step.
公开/授权文献
- US20090218483A1 Analyzing Method and Analyzing Apparatus 公开/授权日：2009-09-03
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