发明授权
- 专利标题： Exposing apparatus having substrate chuck of good flatness
- 专利标题（中）： 具有平坦度好的基板卡盘的曝光装置
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申请号： US11443509申请日： 2006-05-30
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公开(公告)号： US07916277B2公开(公告)日： 2011-03-29
- 发明人: Hee-Uk Chung , Sang-Hwan Cha
- 申请人： Hee-Uk Chung , Sang-Hwan Cha
- 申请人地址： KR Seoul
- 专利权人： LG Display Co., Ltd.
- 当前专利权人： LG Display Co., Ltd.
- 当前专利权人地址： KR Seoul
- 代理机构： Brinks Hofer Gilson & Lione
- 优先权： KR10-2005-0045802 20050530
- 主分类号： G03B27/58
- IPC分类号： G03B27/58
摘要：
An exposing apparatus maintains uniformly a gap between a substrate and a mask stage. The substrate is disposed on a substrate chuck and the substrate chuck is supported by gap motors and air cylinders. The gap motors control the gap between the substrate and the mask stage and the air cylinders support the deflect portion of the substrate chuck to maintain the flatness of the whole area of the substrate.
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