Invention Grant
- Patent Title: Extraction electrode system for high current ion implanter
- Patent Title (中): 高电流离子注入机提取电极系统
-
Application No.: US12050594Application Date: 2008-03-18
-
Publication No.: US07915597B2Publication Date: 2011-03-29
- Inventor: Yongzhang Huang , Ilya Pokidov
- Applicant: Yongzhang Huang , Ilya Pokidov
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J3/14
- IPC: H01J3/14

Abstract:
A system and method extraction electrode system, comprising an extraction electrode, wherein the extraction electrode, further defines an aperture and forms a portion of the outside wall of the ion source and is configured to extract ions from the ion source, a suppression disk half assembly comprising two suppression electrode plate disk halves that form a variable suppression aperture, a ground disk half assembly comprising two ground electrode plate disk halves that form an variable ground aperture, wherein the suppression disk half assembly is configured between the extraction electrode and the ground disk half assembly, wherein the suppression aperture and the ground aperture variable in the direction perpendicular to the ion beam direction of travel, and wherein the extraction electrode system is used with a pendulum reciprocating drive apparatus.
Public/Granted literature
- US20090236547A1 EXTRACTION ELECTRODE SYSTEM FOR HIGH CURRENT ION IMPLANTER Public/Granted day:2009-09-24
Information query