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US07910464B2 Method for manufacturing a semiconductor device having a III-V nitride semiconductor 有权
具有III-V族氮化物半导体的半导体器件的制造方法

Method for manufacturing a semiconductor device having a III-V nitride semiconductor
Abstract:
A semiconductor device of the present invention includes: a III-V nitride semiconductor layer including a channel region in which carriers travel; a concave portion provided in an upper portion of the channel region in the III-V nitride semiconductor layer; and a Schottky electrode consisting of a conductive material forming a Schottky junction with the semiconductor layer, and formed on a semiconductor layer, which spreads over the concave portion and peripheral portions of the concave portion, on the III-V nitride semiconductor layer. A dimension of the concave portion in a depth direction is set so that a portion of the Schottky electrode provided in the concave portion can adjust a quantity of the carriers traveling in the channel region.
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