发明授权
- 专利标题: High-voltage vertical transistor with a multi-layered extended drain structure
- 专利标题(中): 具有多层延伸漏极结构的高压立式晶体管
-
申请号: US10929590申请日: 2004-08-30
-
公开(公告)号: US07829944B2公开(公告)日: 2010-11-09
- 发明人: Donald Ray Disney
- 申请人: Donald Ray Disney
- 申请人地址: US CA San Jose
- 专利权人: Power Integrations, Inc.
- 当前专利权人: Power Integrations, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: The Law Offices of Bradley J. Bereznak
- 主分类号: H01L29/78
- IPC分类号: H01L29/78
摘要:
A high-voltage transistor with a low specific on-state resistance and that supports high voltage in the off-state includes one or more source regions disposed adjacent to a multi-layered extended drain structure which comprises extended drift regions separated from field plate members by one or more dielectric layers. With the field plate members at the lowest circuit potential, the transistor supports high voltages applied to the drain in the off-state. The layered structure may be fabricated in a variety of orientations. A MOSFET structure may be incorporated into the device adjacent to the source region, or, alternatively, the MOSFET structure may be omitted to produce a high-voltage transistor structure having a stand-alone drift region.
公开/授权文献
信息查询
IPC分类: