发明授权
- 专利标题: Multibit electro-mechanical memory device and method of manufacturing the same
- 专利标题(中): 多位机电记忆体装置及其制造方法
-
申请号: US12074645申请日: 2008-03-05
-
公开(公告)号: US07791936B2公开(公告)日: 2010-09-07
- 发明人: Ji-Myoung Lee , Min-Sang Kim , Eun-Jung Yun , Sung-Young Lee , In-Hyuk Choi
- 申请人: Ji-Myoung Lee , Min-Sang Kim , Eun-Jung Yun , Sung-Young Lee , In-Hyuk Choi
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Mills & Onello, LLP
- 优先权: KR10-2007-0022888 20070308
- 主分类号: G11C11/50
- IPC分类号: G11C11/50
摘要:
A multibit electro-mechanical memory device and a method of manufacturing the same include a substrate, a bit line on the substrate; a lower word line and a trap site isolated from the bit line, a pad electrode isolated from a sidewall of the trap site and the lower word line and connected to the bit line, a cantilever electrode suspended over a lower void in an upper part of the trap site, and connected to the pad electrode and curved by an electrical field induced by a charge applied to the lower word line, a contact part for concentrating a charge induced from the cantilever electrode thereon in response to the charge applied from the lower word line and the trap site, the contact part protruding from an end part of the cantilever electrode, and an upper word line formed with an upper void above the cantilever electrode.
公开/授权文献
信息查询