Invention Grant
- Patent Title: Projection lens system of a microlithographic projection exposure installation
- Patent Title (中): 投影透镜系统的微光刻投影曝光装置
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Application No.: US11719074Application Date: 2005-11-17
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Publication No.: US07782440B2Publication Date: 2010-08-24
- Inventor: Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
- Applicant: Helmut Beierl , Sascha Bleidistel , Wolfgang Singer , Toralf Gruner , Alexander Epple , Norbert Wabra , Susanne Beder , Jochen Weber , Heiko Feldmann , Baerbel Schwaer , Olaf Rogalsky , Ari Kazi
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- International Application: PCT/EP2005/012327 WO 20051117
- International Announcement: WO2006/053751 WO 20060526
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A microlithographic projection exposure apparatus comprises a projection objective which images an object onto an image plane and has a lens with a curved surface. In the projection objective there is a liquid or solid medium which directly adjoins the curved surface over a region which is usable for imaging the object. The projection exposure apparatus also has an adjustable manipulator for reducing an image field curvature which is caused by heating of the medium during the projection operation.
Public/Granted literature
- US20080106711A1 Projection Lens System of a Microlithographic Projection Exposure Installation Public/Granted day:2008-05-08
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