Invention Grant
- Patent Title: Methods for treating surfaces
- Patent Title (中): 表面处理方法
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Application No.: US11933770Application Date: 2007-11-01
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Publication No.: US07749327B2Publication Date: 2010-07-06
- Inventor: Nishant Sinha , Gurtej S. Sandhu
- Applicant: Nishant Sinha , Gurtej S. Sandhu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: B08B3/00
- IPC: B08B3/00 ; B08B3/04

Abstract:
Some embodiments include methods for treating surfaces. Beads and/or other insolubles may be dispersed within a liquid carrier to form a dispersion. A transfer layer may be formed across a surface. The dispersion may be directed toward the transfer layer, and the insolubles may impact the transfer layer. The impacting may generate force in the transfer layer, and such force may be transferred through the transfer layer to the surface. The surface may be a surface of a semiconductor substrate, and the force may be utilized to sweep contaminants from the semiconductor substrate surface. The transfer layer may be a liquid, and in some embodiments may be a cleaning solution.
Public/Granted literature
- US20090114246A1 Methods For Treating Surfaces Public/Granted day:2009-05-07
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