发明授权
- 专利标题: Micropattern retardation element
- 专利标题(中): 微模式延迟元件
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申请号: US10593884申请日: 2005-03-29
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公开(公告)号: US07736708B2公开(公告)日: 2010-06-15
- 发明人: Daisaku Matsunaga , Masanori Hashimoto , Christian Ruslim , Takashi Tamaki , Kunihiro Ichimura
- 申请人: Daisaku Matsunaga , Masanori Hashimoto , Christian Ruslim , Takashi Tamaki , Kunihiro Ichimura
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: National Institute Of Advanced Industrial Science and Technology,Nippon Kayaku Kabushiki Kaisha
- 当前专利权人: National Institute Of Advanced Industrial Science and Technology,Nippon Kayaku Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Nields, Lemack & Frame, LLC
- 优先权: JP2004-099122 20040330
- 国际申请: PCT/JP2005/005848 WO 20050329
- 国际公布: WO2005/096041 WO 20051013
- 主分类号: G02F1/1337
- IPC分类号: G02F1/1337 ; G02F1/13363
摘要:
The present invention relates to a micropattern retardation element requiring no stretch processing and no extremely high positioning accuracy in cutting films, and the like, and having the retardation region controlled in width of a micron unit, and a producing method therefore. Said micropattern retardation element can be obtained by forming a liquid crystalline or non liquid crystalline polymer thin film layer having photoactive groups, on a substrate, and then, after orientation treatment in a micropattern form, forming a birefringence layer so as to contact with said polymer thin film layer, so that birefringence molecules of said birefringence layer are oriented according to orientation of photoactive groups in said thin film. Said retardation element is used in a three-dimensional display, and the like.
公开/授权文献
- US20070134442A1 Micropattern retardation element 公开/授权日:2007-06-14
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