Invention Grant
- Patent Title: Device arranged to measure a quantity relating to radiation and lithographic apparatus
- Patent Title (中): 用于测量与辐射和光刻设备有关的数量的设备
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Application No.: US11797358Application Date: 2007-05-02
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Publication No.: US07724349B2Publication Date: 2010-05-25
- Inventor: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derek Jan Wilfred Klunder
- Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derek Jan Wilfred Klunder
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/54
Abstract:
A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
Public/Granted literature
- US20080273188A1 Device arranged to measure a quantity relating to radiation and lithographic apparatus Public/Granted day:2008-11-06
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