发明授权
- 专利标题： Device arranged to measure a quantity relating to radiation and lithographic apparatus
- 专利标题（中）： 用于测量与辐射和光刻设备有关的数量的设备
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申请号： US11797358申请日： 2007-05-02
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公开(公告)号： US07724349B2公开(公告)日： 2010-05-25
- 发明人: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derek Jan Wilfred Klunder
- 申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derek Jan Wilfred Klunder
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/54
摘要：
A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
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