发明授权
- 专利标题： EUV pellicle with increased EUV light transmittance
- 专利标题（中）： EUV防护薄膜与EUV透光率增加
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申请号： US11595085申请日： 2006-11-10
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公开(公告)号： US07723704B2公开(公告)日： 2010-05-25
- 发明人: Obert Reeves Wood, II , Ryoung-Han Kim , Thomas Wallow
- 申请人： Obert Reeves Wood, II , Ryoung-Han Kim , Thomas Wallow
- 申请人地址： KY Grand Cayman
- 专利权人： Globalfoundries Inc.
- 当前专利权人： Globalfoundries Inc.
- 当前专利权人地址： KY Grand Cayman
- 代理机构： Farjami & Farjami LLP
- 主分类号： G03F1/00
- IPC分类号： G03F1/00
摘要：
According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle for protecting a lithographic mask includes an aerogel film. The pellicle further includes a frame for mounting the aerogel film over the lithographic mask. The aerogel film causes the pellicle to have increased EUV light transmittance.
公开/授权文献
- US20080113491A1 EUV pellicle with increased EUV light transmittance 公开/授权日：2008-05-15
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