发明授权
- 专利标题: Multi-bit electro-mechanical memory device and method of manufacturing the same
- 专利标题(中): 多位机电记忆体装置及其制造方法
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申请号: US12002668申请日: 2007-12-18
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公开(公告)号: US07719068B2公开(公告)日: 2010-05-18
- 发明人: Sung-Young Lee , Dong-Won Kim , Min-Sang Kim , Eun-Jung Yun , Dong-Gun Park
- 申请人: Sung-Young Lee , Dong-Won Kim , Min-Sang Kim , Eun-Jung Yun , Dong-Gun Park
- 申请人地址: KR
- 专利权人: Samsung Electronics, Co., Ltd.
- 当前专利权人: Samsung Electronics, Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Mills & Onello, LLP
- 优先权: KR10-2006-0129884 20061219
- 主分类号: G11C11/50
- IPC分类号: G11C11/50
摘要:
There are provided a multi-bit electro-mechanical memory device capable of enhancing or maximizing a degree of integration of the memory device and a method of manufacturing the multi-bit electro-mechanical memory device which includes a substrate, a bit line on the substrate, and extending in a first direction; a word line on the bit line, insulated from the bit line, and extending in a second direction transverse to the first direction, and a cantilever electrode including a shape memory alloy. The cantilever electrode has a first portion electrically connected to the bit line and a second portion extending in the first direction, and spaced apart from the word line by an air gap, wherein the cantilever electrode, in a first state, is in electrical contact with the word line, and, in a second state, is spaced apart from the word line.
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