Invention Grant
- Patent Title: Method of manufacturing capacitor-embedded low temperature co-fired ceramic substrate
- Patent Title (中): 制造电容器嵌入式低温共烧陶瓷基板的方法
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Application No.: US11819897Application Date: 2007-06-29
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Publication No.: US07703198B2Publication Date: 2010-04-27
- Inventor: Seung Gyo Jeong , Yong Seok Choi , Ki Pyo Hong
- Applicant: Seung Gyo Jeong , Yong Seok Choi , Ki Pyo Hong
- Applicant Address: KR Gyunggi-Do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Gyunggi-Do
- Agency: McDermott Will & Emery LLP
- Priority: KR10-2006-0060706 20060630
- Main IPC: H05K3/30
- IPC: H05K3/30 ; H01G4/06

Abstract:
A method of manufacturing a capacitor-embedded low temperature co-fired ceramic substrate. A capacitor part is manufactured by firing a deposition including at least one high dielectric ceramic sheet to form a capacitor part. A plurality of low temperature co-fired green sheets are provided. Each of the low temperature co-fired green sheet has at least one of a conductive pattern and a conductive via hole thereon. A low temperature co-fired ceramic deposition is formed by depositing the low temperature co-fired green sheets to embed the capacitor part in the low temperature co-fired ceramic deposition. The embedded capacitor part is connected either to the conductive pattern or the conductive via hole of an adjacent green sheet. Then the low temperature co-fired ceramic deposition having the capacitor part embedded therein is fired.
Public/Granted literature
- US20080000061A1 Method of manufacturing capacitor-embedded low temperature co-fired ceramic substrate Public/Granted day:2008-01-03
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