Invention Grant
US07691766B2 Material, particularly for an optical component for use in microlithography, and method for making a blank from the material
有权
材料,特别是用于微光刻中使用的光学部件的材料,以及从该材料制造坯料的方法
- Patent Title: Material, particularly for an optical component for use in microlithography, and method for making a blank from the material
- Patent Title (中): 材料,特别是用于微光刻中使用的光学部件的材料,以及从该材料制造坯料的方法
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Application No.: US11788007Application Date: 2007-04-18
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Publication No.: US07691766B2Publication Date: 2010-04-06
- Inventor: Bodo Kuehn , Stefan Ochs
- Applicant: Bodo Kuehn , Stefan Ochs
- Applicant Address: DE Hanau
- Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee: Heraeus Quarzglas GmbH & Co. KG
- Current Assignee Address: DE Hanau
- Agency: Tiajoloff & Kelly LLP
- Priority: DE102006018711 20060420
- Main IPC: C04B35/00
- IPC: C04B35/00 ; C04B35/14 ; C04B35/16 ; C01B15/14 ; C01B33/12

Abstract:
The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.
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