发明授权
- 专利标题： Resist composition and pattern forming method using the same
- 专利标题（中）： 抗蚀剂组合物和图案形成方法使用其
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申请号： US11727002申请日： 2007-03-23
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公开(公告)号： US07691560B2公开(公告)日： 2010-04-06
- 发明人: Kazuyoshi Mizutami , Shinichi Sugiyama
- 申请人： Kazuyoshi Mizutami , Shinichi Sugiyama
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2006-081108 20060323; JP2006-218462 20060810; JP2007-033845 20070214
- 主分类号： G03F7/00
- IPC分类号： G03F7/00
摘要：
A resist composition comprising at least one kind of a nitrogen-containing compound selected from the group consisting of an amine compound having a phenoxy group, an ammonium salt compound having a phenoxy group, an amine compound having a sulfonic acid ester group and an ammonium salt compound having a sulfonic acid ester group; and a pattern forming method using the composition.
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