发明授权
- 专利标题： Aqueous based residue removers comprising fluoride
- 专利标题（中）： 含氟的残留物去除剂
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申请号： US11050562申请日： 2005-02-03
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公开(公告)号： US07682458B2公开(公告)日： 2010-03-23
- 发明人: Roberto John Rovito , Aiping Wu
- 申请人： Roberto John Rovito , Aiping Wu
- 申请人地址： US PA Allentown
- 专利权人： Air Products and Chemicals, Inc.
- 当前专利权人： Air Products and Chemicals, Inc.
- 当前专利权人地址： US PA Allentown
- 代理商 Rosaleen P. Morris-Oskanian
- 主分类号： C11D7/32
- IPC分类号： C11D7/32
摘要：
A composition and method comprising same for selectively removing residues such as, for example, ashed photoresist and/or processing residues are disclosed herein. In one aspect, there is provided a composition for removing residue wherein the composition has a pH ranging from about 2 to about 9 comprising: a buffer solution comprising an organic acid and a conjugate base of the organic acid in a molar ratio of acid to base ranging from 10:1 to 1:10; a fluoride, and water, provided that the composition is substantially free of an added organic solvent. In another aspect, the composition may further comprise a corrosion inhibitor.
公开/授权文献
- US20060172905A1 Aqueous based residue removers comprising fluoride 公开/授权日：2006-08-03
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