发明授权
US07655386B2 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device
有权
具有抗反射性的聚合物，包含其的硬掩模组合物，用于形成图案化材料层的方法和相关联的装置
- 专利标题： Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device
- 专利标题（中）： 具有抗反射性的聚合物，包含其的硬掩模组合物，用于形成图案化材料层的方法和相关联的装置
-
申请号： US12003152申请日： 2007-12-20
-
公开(公告)号： US07655386B2公开(公告)日： 2010-02-02
- 发明人: Kyung Hee Hyung , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyong Ho Yoon , Min Soo Kim , Jin Kuk Lee
- 申请人： Kyung Hee Hyung , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyong Ho Yoon , Min Soo Kim , Jin Kuk Lee
- 申请人地址： KR Gumi-si, Gyeongsangbuk-do
- 专利权人： Cheil Industries, Inc.
- 当前专利权人： Cheil Industries, Inc.
- 当前专利权人地址： KR Gumi-si, Gyeongsangbuk-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2006-0131034 20061220
- 主分类号： G03F7/40
- IPC分类号： G03F7/40 ; C08G61/12 ; C07C2/88 ; C07F9/40 ; G03F7/11
摘要：
An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1 is methylene or includes a non-fluorene-containing aryl linking group.
公开/授权文献
信息查询
IPC分类:
