发明授权
- 专利标题: Ion source and mass spectrometer instrument using the same
- 专利标题(中): 离子源和质谱仪使用相同
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申请号: US10139241申请日: 2002-05-07
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公开(公告)号: US07645983B2公开(公告)日: 2010-01-12
- 发明人: Atsumu Hirabayashi , Minoru Sakairi , Yasuaki Takada , Hideaki Koizumi , Kaoru Umemura
- 申请人: Atsumu Hirabayashi , Minoru Sakairi , Yasuaki Takada , Hideaki Koizumi , Kaoru Umemura
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Brundidge & Stanger, P.C.
- 主分类号: H01J49/00
- IPC分类号: H01J49/00
摘要:
An ion source includes a body having a gas passage and an orifice. A capillary is inserted into the gas passage so that a tip portion of the capillary extends into the orifice. A gas supplier supplies a gas into the gas passage to form a gas flow through the gas passage along the capillary and through the orifice past a tip of the capillary so that the gas flow sprays a sample solution flowing through the capillary from the tip of the capillary. A flow controller regulates a pressure of the gas in the gas passage to adjust a characteristic value F/S to a predetermined value, where F is a flow rate of the gas flow at standard conditions (20° C., 1 atmosphere), and S is a difference between a cross section of the orifice and a cross section of the tip portion of the capillary in the orifice.
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