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发明授权
US07593091B2 Imaging or exposure device, in particular for making an electronic microcircuit 有权
成像或曝光装置，特别是制造电子微电路

Imaging or exposure device, in particular for making an electronic microcircuit
摘要：
The imaging or exposure device comprises a radiation source (1), a reticle (3) mounted between the radiation source and an optical projection system (4) for shaping the radiation downstream from the reticle (3), the optical projection system (4) comprising a series of mirrors (7, 8, 10, 11) including at least two mirrors (10, 11) that are deformable, having deformer members (12, 13) connected to a control unit (14) associated with an image analyzer (15) to deform the two deformable mirrors in separate manner, firstly as a function of differences relative to an image quality setpoint, and second as a function of differences relative to an image distortion setpoint.
摘要（中）：

成像或曝光装置包括辐射源（1），安装在辐射源和光学投影系统（4）之间的掩模版（3），用于使来自掩模版（3）下游的辐射成形，光学投影系统（4） 包括一系列反射镜（7,8,10,11），其包括可变形的至少两个反射镜（10,11），其具有连接到与图像分析器相关联的控制单元（14）的变形构件（12,13） 15）以分离的方式使两个可变形反射镜变形，首先作为相对于图像质量设定点的差异的函数，而第二个作为相对于图像失真设定点的差的函数。

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