Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US11637946Application Date: 2006-12-13
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Publication No.: US07592604B2Publication Date: 2009-09-22
- Inventor: Hirotami Koike , Shinichi Okada , Akira Higuchi , Masahiro Inoue , Masahiro Yamamoto , Sumio Sasaki
- Applicant: Hirotami Koike , Shinichi Okada , Akira Higuchi , Masahiro Inoue , Masahiro Yamamoto , Sumio Sasaki
- Applicant Address: JP Tokyo
- Assignee: Topcon Corporation
- Current Assignee: Topcon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kubovcik & Kubovcik
- Priority: JP2005-362703 20051216
- Main IPC: G01K1/08
- IPC: G01K1/08 ; H01J3/14 ; H01J3/16

Abstract:
The present invention provides a charged particle beam apparatus capable of preventing the charging-up of the specimen without using a large-scale facility. A scanning electron microscope 100 illuminates a specimen 21 with a charged particle beam via a charged particle optical system arranged in a column. According to the present invention, the scanning electron microscope 100 has a charge preventive member 110 disposed between the objective lens 14 and the specimen 21. The charge preventive member 110 has an electrically conductive portion and an opening 113 to transmit the charged particle beam. The charge preventive member 110 is formed so as to partly cover the charged particle optical system when viewed from the charged particle beam irradiation spot on the specimen. In addition, the charge preventive member 110 has gas inflow paths 114 and 115 formed therein. These gas inflow paths have gas injection outlets 116 formed to inject gas toward the charged particle beam irradiation spot on the specimen.
Public/Granted literature
- US20070246651A1 Charged particle beam apparatus Public/Granted day:2007-10-25
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