发明授权
- 专利标题: Laser annealing apparatus
- 专利标题(中): 激光退火装置
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申请号: US11691131申请日: 2007-03-26
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公开(公告)号: US07519252B2公开(公告)日: 2009-04-14
- 发明人: Hiroyuki Morita
- 申请人: Keiko Morita, legal representative
- 申请人地址: JP Kanagawa
- 专利权人: Laserfront Technologies, Inc.
- 当前专利权人: Laserfront Technologies, Inc.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2006-086712 20060327
- 主分类号: G02B6/04
- IPC分类号: G02B6/04
摘要:
A laser annealing apparatus comprises a laser oscillator having a Q switching action, one or a plurality of partially reflective mirrors for split a laser beam emitted from the laser oscillator into a plurality of laser beams, a plurality of optical fibers which respectively transmit the plurality of laser beams split by the partially reflective mirrors, and whose respective emission ends are arranged linearly in one direction, a first optical system for synthesizing and homogenizing the plurality of laser beams emitted from the optical fibers, and a second optical system for focusing the laser beam emitted from the first optical system on the work piece surface as a rectangular laser beam whose beam shape is long in the lateral direction and short in the longitudinal direction. As a result, laser power transmission by means of slender optical fibers is possible even in cases in which a green laser such as the second harmonic of an Nd:YAG laser having a Q switching action or the like is used as a heating light source. Accordingly, a compact laser annealing apparatus that has a high-quality working performance and does not require a laser amplifier or high-frequency generating apparatus can be obtained.
公开/授权文献
- US20070237475A1 LASER ANNEALING APPARATUS 公开/授权日:2007-10-11
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