发明授权
US07456428B2 Manufacturing method of semiconductor film and image display device
有权
半导体薄膜和图像显示装置的制造方法
- 专利标题: Manufacturing method of semiconductor film and image display device
- 专利标题(中): 半导体薄膜和图像显示装置的制造方法
-
申请号: US11711623申请日: 2007-02-28
-
公开(公告)号: US07456428B2公开(公告)日: 2008-11-25
- 发明人: Mutsuko Hatano , Mikio Hongo , Akio Yazaki , Mitsuharu Tai , Takeshi Noda , Yukio Takasaki
- 申请人: Mutsuko Hatano , Mikio Hongo , Akio Yazaki , Mitsuharu Tai , Takeshi Noda , Yukio Takasaki
- 申请人地址: JP Mobara-shi
- 专利权人: Hitachi Displays, Ltd.
- 当前专利权人: Hitachi Displays, Ltd.
- 当前专利权人地址: JP Mobara-shi
- 代理机构: Mattingly, Stanger, Malur & Brundidge, P.C.
- 优先权: JP2004-022473 20040130
- 主分类号: H01L29/04
- IPC分类号: H01L29/04
摘要:
A semiconductor thin film is manufactured by scanning laser light or a substrate onto an arbitrary region of the semiconductor thin film and irradiating a laser thereon. The semiconductor thin film is formed by the substantially belt-shaped crystal being crystallized such that crystalline grains grow in the scanning direction, on the substrate, on XY coordinates where value x of beam size W (μm) of the laser light measured in substantially the same direction as the scanning direction is defined as X axis, and where value y of scanning velocity Vs (m/s) is defined as Y axis, the crystallization processing is performed within a region where all of the following conditions hold: condition 1: the beam size W is larger than wavelength of the laser beam, condition 2: the scanning velocity Vs is smaller than upper-limit of crystal growth speed, and condition 3: x×(1/y)
公开/授权文献
信息查询
IPC分类: