Invention Grant
- Patent Title: Method for producing silicon single crystal and silicon single crystal
- Patent Title (中): 硅单晶和硅单晶的制造方法
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Application No.: US11492705Application Date: 2006-07-24
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Publication No.: US07456082B2Publication Date: 2008-11-25
- Inventor: Keisei Abe
- Applicant: Keisei Abe
- Applicant Address: JP Tokyo
- Assignee: Sumco Corporation
- Current Assignee: Sumco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Kolisch Hartwell, PC
- Priority: JPP2005-214236 20050725
- Main IPC: H01L21/30
- IPC: H01L21/30 ; H01L21/46

Abstract:
In a method for producing a silicon single by pulling the silicon single crystal from a silicon melt contained in a crucible, a magnetic field is applied to the silicon melt in a radial direction of the silicon single crystal, and a vertical level of a center of the magnetic field relative to a surface of the silicon melt is controlled such that a thermal gradient in an axial direction of the crystal is maintained at a constant value in respective portions along a radial direction of the silicon single crystal.
Public/Granted literature
- US20070028833A1 Method for producing silicon single crystal and silicon single crystal Public/Granted day:2007-02-08
Information query
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