Invention Grant
- Patent Title: Plasma generation apparatus
- Patent Title (中): 等离子体发生装置
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Application No.: US11356947Application Date: 2006-02-16
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Publication No.: US07411148B2Publication Date: 2008-08-12
- Inventor: Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
- Applicant: Gi-Chung Kwon , Sang-Won Lee , Sae-Hoon Uhm , Jae-Hyun Kim , Bo-Han Hong , Yong-Kwan Lee
- Applicant Address: KR Gyunggi-Do
- Assignee: Jusung Engineering Co., Ltd.
- Current Assignee: Jusung Engineering Co., Ltd.
- Current Assignee Address: KR Gyunggi-Do
- Agency: Marger, Johnson & McCollom, PC
- Priority: KR10-2005-0013187 20050217
- Main IPC: B23K9/00
- IPC: B23K9/00 ; B23K9/02

Abstract:
A plasma generation apparatus includes: a chamber having a chamber lid and defining an airtight reaction region; a susceptor in the chamber; a gas supplier supplying a process gas to the chamber; and a toroidal core vertically disposed with respect to the susceptor through the chamber lid, including: a toroidal ferromagnetic core combined with the chamber, the toroidal ferromagnetic core having a first portion outside the chamber and a second portion inside the chamber, the second portion having an opening portion; a radio frequency (RF) power supply connected to the chamber; an induction coil electrically connected to the RF power supply, the induction coil rolling the first portion; and a matching circuit matching an impedance between the RF power supply and the induction coil.
Public/Granted literature
- US20060191880A1 Plasma generation apparatus Public/Granted day:2006-08-31
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