发明授权
US07405804B2 Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby
失效
具有增强的光谱纯度的光刻设备，由此制造的器件制造方法和器件
- 专利标题： Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby
- 专利标题（中）： 具有增强的光谱纯度的光刻设备，由此制造的器件制造方法和器件
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申请号： US10958666申请日： 2004-10-06
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公开(公告)号： US07405804B2公开(公告)日： 2008-07-29
- 发明人: Levinus Pieter Bakker
- 申请人： Levinus Pieter Bakker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/54
摘要：
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support configured to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the radiation beam is reflected from at least one grazing incidence mirror that enhances the spectral purity of the radiation beam.
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