发明授权
- 专利标题： Apparatus for processing substrates and method therefor
- 专利标题（中）： 用于处理衬底的设备及其方法
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申请号： US11151870申请日： 2005-06-13
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公开(公告)号： US07371023B2公开(公告)日： 2008-05-13
- 发明人: Yu-Ying Chan , Ching-Lung Wang , Wen-Cheng Hsu , Tseng-Kui Tseng , Chen Kun Teng , Ho-Li Hsieh
- 申请人： Yu-Ying Chan , Ching-Lung Wang , Wen-Cheng Hsu , Tseng-Kui Tseng , Chen Kun Teng , Ho-Li Hsieh
- 申请人地址： TW Miao-Li County
- 专利权人： Innolux Display Corp.
- 当前专利权人： Innolux Display Corp.
- 当前专利权人地址： TW Miao-Li County
- 代理商 Wei Te Chung
- 主分类号： G03D5/00
- IPC分类号： G03D5/00
摘要：
An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.
公开/授权文献
- US20050274400A1 Apparatus for processing substrates and method therefor 公开/授权日：2005-12-15
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