发明授权
- 专利标题: Field effect transistor
- 专利标题(中): 场效应晶体管
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申请号: US11081348申请日: 2005-03-16
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公开(公告)号: US07358550B2公开(公告)日: 2008-04-15
- 发明人: Yukio Nakabayashi , Kazumi Nishinohara , Atsuhiro Kinoshita , Junji Koga
- 申请人: Yukio Nakabayashi , Kazumi Nishinohara , Atsuhiro Kinoshita , Junji Koga
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Amin, Turocy & Calvin, LLP
- 优先权: JP2004-092537 20040326
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
An field effect transistor includes a first semiconductor region, a gate electrode insulatively disposed over the first semiconductor region, source and drain electrodes between which the first semiconductor region is sandwiched, and second semiconductor regions each formed between the first semiconductor region and one of the source and drain electrodes, and having impurity concentration higher than that of the first semiconductor region, the source electrode being offset to the gate electrode in a direction in which the source electrode and the drain electrode are separated from each other with respect to a channel direction, and one of the second semiconductor regions having a thickness not more than a thickness with which the one of second semiconductor regions is completely depleted in the channel direction being in thermal equilibrium with the source electrode therewith.
公开/授权文献
- US20050212055A1 Field effect transistor 公开/授权日:2005-09-29
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