发明授权
- 专利标题: Methods for configuring a plasma cluster tool
- 专利标题(中): 配置等离子体簇工具的方法
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申请号: US11097839申请日: 2005-03-31
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公开(公告)号: US07353379B2公开(公告)日: 2008-04-01
- 发明人: Chung-Ho Huang , Shih-Jeun Fan , Chin-Chuan Chang
- 申请人: Chung-Ho Huang , Shih-Jeun Fan , Chin-Chuan Chang
- 申请人地址: US CA Fremont
- 专利权人: Lam Research Corporation
- 当前专利权人: Lam Research Corporation
- 当前专利权人地址: US CA Fremont
- 代理机构: IP Strategy Group, P.C.
- 主分类号: G06F15/177
- IPC分类号: G06F15/177
摘要:
A method for configuring a plasma cluster tool is disclosed. The method includes generating a key file from option specifications, the key file encapsulating configuration restrictions specifically imposed on the plasma cluster tool. The method also includes generating at least one system-wide configuration file and at least one component-level configuration file using the key file. The method additionally includes generating run-time executable objects from a database of option definition files, the at least one system-wide configuration file and the at least one component-level configuration file. Furthermore, the method includes employing the run-time executable objects to configure the plasma cluster tool.
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