发明授权
US07349090B2 Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
有权
用于确定在光刻之前，期间或之后的样品的性质的方法和系统
- 专利标题： Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
- 专利标题（中）： 用于确定在光刻之前，期间或之后的样品的性质的方法和系统
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申请号： US09956849申请日： 2001-09-20
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公开(公告)号： US07349090B2公开(公告)日： 2008-03-25
- 发明人: Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
- 申请人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
- 申请人地址： US CA Milpitas
- 专利权人： KLA-Tencor Technologies Corp.
- 当前专利权人： KLA-Tencor Technologies Corp.
- 当前专利权人地址： US CA Milpitas
- 代理机构： Baker & McKenzie LLP
- 主分类号： G01J4/00
- IPC分类号： G01J4/00
摘要：
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a property of a specimen prior to, during, or subsequent to lithography. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
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