发明授权
US07318769B2 System and method for removing film from planar substrate peripheries
有权
从平面基板外围去除薄膜的系统和方法
- 专利标题： System and method for removing film from planar substrate peripheries
- 专利标题（中）： 从平面基板外围去除薄膜的系统和方法
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申请号： US11284028申请日： 2005-11-22
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公开(公告)号： US07318769B2公开(公告)日： 2008-01-15
- 发明人: James Ernest Hinkle
- 申请人： James Ernest Hinkle
- 申请人地址： US OH Perrysburg
- 专利权人： First Solar, Inc.
- 当前专利权人： First Solar, Inc.
- 当前专利权人地址： US OH Perrysburg
- 代理机构： Steptoe & Johnson LLP
- 主分类号： B24B1/00
- IPC分类号： B24B1/00
摘要：
A system for removing film from a planar substrate includes a shuttle which transports a film-coated substrate through a film removal station to a rotation station. At the rotation station, the substrate is removed from the shuttle and rotated to a new orientation. After being repositioned on the shuttle, the substrate is transported by the shuttle through a second film removal station.
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