Invention Grant
- Patent Title: Fabrication system and fabrication method
- Patent Title (中): 制造系统及制造方法
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Application No.: US11320778Application Date: 2005-12-30
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Publication No.: US07310563B2Publication Date: 2007-12-18
- Inventor: Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
- Applicant: Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
- Applicant Address: JP Tokyo
- Assignee: Renesas Technology Corp.
- Current Assignee: Renesas Technology Corp.
- Current Assignee Address: JP Tokyo
- Agency: Mattingly, Stanger, Malur & Brundidge, PC
- Priority: JP5-175114 19930715; JP5-215489 19930831
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A fabricating method for a system including a plurality of processing apparatuses connected to each other by an inter-apparatus transporter. The semiconductor waters are processed in the processing apparatuses and are transported to specified processing apparatuses in different time interval that are set to N times a unit time interval. Since the fabricating system includes processing apparatuses and an inter-apparatus transporter that are periodically controlled at time intervals related to a unit time, intervals related to a unit time, the scheduling of a plurality of works can be made efficiently to enhance the level of optimization, thus improving the productivity.
Public/Granted literature
- US20060111805A1 Fabrication system and fabrication method Public/Granted day:2006-05-25
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