发明授权
US07210246B2 Methods and systems for handling a workpiece in vacuum-based material handling system 有权
在真空材料处理系统中处理工件的方法和系统

Methods and systems for handling a workpiece in vacuum-based material handling system
摘要:
Methods and systems are provided for handling an item in a vacuum-based handling system for semiconductor manufacturing. The methods include providing a heater or dryer for the load lock of the handling system that dries a semiconductor wafer during the pumping down of the load lock.
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