发明授权
- 专利标题: Heat-sensitive lithographic printing plate precursor
- 专利标题(中): 热敏平版印刷版前体
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申请号: US10834555申请日: 2004-04-29
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公开(公告)号: US07205084B2公开(公告)日: 2007-04-17
- 发明人: Marc Van Damme , Huub Van Aert
- 申请人: Marc Van Damme , Huub Van Aert
- 申请人地址: BE Mortsel
- 专利权人: AGFA-Gevaert
- 当前专利权人: AGFA-Gevaert
- 当前专利权人地址: BE Mortsel
- 代理机构: Leydig, Voit & Mayer, Ltd.
- 优先权: EP03104784.8 20031218
- 主分类号: G03F7/11
- IPC分类号: G03F7/11 ; G03F7/30
摘要:
A heat-sensitive lithographic printing plate precursor is disclosed which comprises a hydrophilic support and an oleophilic coating thereon which comprises an infrared light-to-heat converter, an alkali-soluble binder and a polymeric developer accelerator. The polymeric developer accelerator is preferably a phenolic formaldehyde resin comprising at least 70 mol % of meta-cresol as recurring unit or at least 40 mol % of monohydroxy benzene cresol as recurring unit. The PDA may also be a phenolic resin which comprises at least 5 mol % of a recurring monomeric unit having at least one phenolic hydroxyl group and at least one alkali solubilising group. The polymeric developer accelerator improves the sensitivity while maintaining a good under-exposure latitude and a good developer resistance of the printing plate.
公开/授权文献
- US20050136356A1 Heat-sensitive lithographic printing plate precursor 公开/授权日:2005-06-23
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