Invention Grant
- Patent Title: Method and apparatus for specimen fabrication
- Patent Title (中): 用于样品制造的方法和装置
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Application No.: US11452378Application Date: 2006-06-14
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Publication No.: US07176458B2Publication Date: 2007-02-13
- Inventor: Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
- Applicant: Satoshi Tomimatsu , Kaoru Umemura , Yuichi Madokoro , Yoshimi Kawanami , Yasunori Doi
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout and Kraus, LLP.
- Priority: JP9-196213 19970722; JP9-263184 19970929; JP9-263185 19970929
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
A specimen fabrication apparatus including: an ion source, an optical system for irradiating a projection ion beam to a sample, wherein the optical system includes a patterning mask to form a ion beam emitted from the ion source into the projection ion beam, a sample stage to mount the sample, a vacuum specimen chamber to contain the sample stage, a probe for separating a micro-specimen from the sample by irradiation of the projection ion beam, a specimen holder to fix the micro-specimen, wherein the projection ion beam is irradiated to the micro-specimen fixed to the specimen holder and extracted by the probe in the specimen chamber, so that a finish fabrication to the micro-specimen is enabled.
Public/Granted literature
- US20060231776A1 Method and apparatus for specimen fabrication Public/Granted day:2006-10-19
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