Invention Grant
- Patent Title: Nitride semiconductor with active layer of quantum well structure with indium-containing nitride semiconductor
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Application No.: US10801038Application Date: 2004-03-16
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Publication No.: US07166869B2Publication Date: 2007-01-23
- Inventor: Shuji Nakamura , Shinichi Nagahama , Naruhito Iwasa
- Applicant: Shuji Nakamura , Shinichi Nagahama , Naruhito Iwasa
- Applicant Address: JP Tokushima
- Assignee: Nichia Corporation
- Current Assignee: Nichia Corporation
- Current Assignee Address: JP Tokushima
- Agency: Nixon & Vanderhye P.C.
- Priority: JP7-287189 19951106; JP7-305279 19951124; JP7-305280 19951124; JP7-305281 19951124; JP7-317850 19951206; JP7-332056 19951220; JP8-186339 19960716; JP8-228147 19960829
- Main IPC: H01L27/15
- IPC: H01L27/15 ; H01L31/12

Abstract:
A nitride semiconductor device has a nitride semiconductor layer structure. The structure includes an active layer of a quantum well structure containing an indium-containing nitride semiconductor. A first nitride semiconductor layer having a band gap energy larger than that of the active layer is provided in contact with the active layer. A second nitride semiconductor layer having a band gap energy smaller than that of the first layer is provided over the first layer. Further, a third nitride semiconductor layer having a band gap energy larger than that of the second layer is provided over the second layer.
Public/Granted literature
- US20040183063A1 NITRIDE SEMICONDUCTOR WITH ACTIVE LAYER OF WELL STRUCTURE WITH INDIUM-CONTAINING NITRIDE SEMICONDUCTOR Public/Granted day:2004-09-23
Information query
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