发明授权
- 专利标题: Retaining ring assembly for use in chemical mechanical polishing
- 专利标题(中): 固定环组件用于化学机械抛光
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申请号: US10865626申请日: 2004-06-10
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公开(公告)号: US07029386B2公开(公告)日: 2006-04-18
- 发明人: Richard T. Young
- 申请人: Richard T. Young
- 申请人地址: US CA Anaheim
- 专利权人: R & B Plastics, Inc.
- 当前专利权人: R & B Plastics, Inc.
- 当前专利权人地址: US CA Anaheim
- 代理机构: Holland & Knight LLP
- 主分类号: B24B21/18
- IPC分类号: B24B21/18 ; B24B33/00 ; B24B47/26 ; B24B55/00
摘要:
A retaining ring assembly for use in chemical mechanical polishing that includes an annular plastic retaining ring portion defining an annular projection thereon, an annular metal backing defining an annular channel therein for receiving the projection and a pair of elongated spring members concentrically disposed about the annular projection on the retaining ring. The channel in the backing is sized so as to receive the annular projection on the retaining ring and spring members therein upon the retaining ring being urged against the backing whereupon the spring members bear against the projection on the retaining ring and portions of the annular backing so as to releasably secure the retaining ring to the backing such that the retaining ring can be replaced upon becoming worn during use and the metal backing can be reused.
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