发明授权
- 专利标题: N-gate transistor
- 专利标题(中): N栅晶体管
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申请号: US10610835申请日: 2003-06-30
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公开(公告)号: US06960517B2公开(公告)日: 2005-11-01
- 发明人: Rafael Rios , Brian S. Doyle , Thomas D. Linton, Jr. , Jack Kavalieros
- 申请人: Rafael Rios , Brian S. Doyle , Thomas D. Linton, Jr. , Jack Kavalieros
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Blakley, Sokoloff, Taylor & Zafman LLP
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/786 ; H01L21/3205
摘要:
A n-gate transistor, and method of forming such, including source/drain regions connected by a channel region and a gate electrode coupled to the channel region. The channel region has many angled edges protruding into the gate electrode. The many angled edges are to act as electrically conducting channel conduits between source/drain regions.
公开/授权文献
- US20040262699A1 N-gate transistor 公开/授权日:2004-12-30
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