Invention Grant
- Patent Title: Underlayer for high amplitude spin valve sensors
- Patent Title (中): 用于高振幅自旋阀传感器的底层
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Application No.: US09846707Application Date: 2001-04-30
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Publication No.: US06954342B2Publication Date: 2005-10-11
- Inventor: Witold Kula , Alexander Zeltser
- Applicant: Witold Kula , Alexander Zeltser
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G01R33/09
- IPC: G01R33/09 ; G11B5/012 ; G11B5/39 ; G11B5/33

Abstract:
A spin valve sensor system and a method for fabricating the same are provided. Such spin valve sensor includes a pinned layer having a pinned layer magnetization. Also included is a free layer disposed adjacent the pinned layer. The free layer has a free layer magnetization perpendicular to the pinned layer magnetization in the absence of an external field. A pinning layer is disposed adjacent the pinned layer for fixing the pinned layer magnetization. Further included is an underlayer disposed adjacent the pinning layer. Such underlayer comprises NiFeX. Disposed adjacent the underlayer and the pinning layer is an upper layer. The upper layer comprises a material selected from the group consisting of NiFe and CoFe for increasing a GMR ratio associated with the SV sensor.
Public/Granted literature
- US20020159205A1 Underlayer for high amplitude spin valve sensors Public/Granted day:2002-10-31
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