发明授权
- 专利标题: Neutral particle beam processing apparatus
- 专利标题(中): 中性粒子束处理装置
-
申请号: US10451635申请日: 2002-03-22
-
公开(公告)号: US06858838B2公开(公告)日: 2005-02-22
- 发明人: Katsunori Ichiki , Kazuo Yamauchi , Hirokuni Hiyama , Seiji Samukawa
- 申请人: Katsunori Ichiki , Kazuo Yamauchi , Hirokuni Hiyama , Seiji Samukawa
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2001-088860 20010326
- 国际申请: PCTJP02/02748 WO 20020322
- 国际公布: WO0207804 WO 20021003
- 主分类号: H05H1/46
- IPC分类号: H05H1/46 ; B01J19/08 ; C23C14/32 ; C23C16/50 ; H01J27/16 ; H01J37/08 ; H01J37/317 ; H01J37/32 ; H01L21/205 ; H01L21/302 ; H01L21/3065 ; H05H3/02 ; H01L21/306
摘要:
A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes (5, 6) involving the plasma generated by the plasma generator therebetween, and a power supply (102) for applying a voltage between the pair of electrodes (5, 6). The pair of electrodes (5, 6) accelerate the positive ions and/or the negative ions generated by the plasma generator. The positive ions and/or the negative ions are neutralized and converted into neutral particles while being drifted in the plasma between the pair of electrodes (5, 6) toward a workpiece (X). The accelerated neutral particles pass through one of the electrodes (6) and are applied to the workpiece (X).
公开/授权文献
- US20040074604A1 Neutral particle beam processing apparatus 公开/授权日:2004-04-22
信息查询
IPC分类: